X-ray Photoemission Spectroscopy (XPS) is widely used surface analysis technique because it provides quantitative and qualitative chemical state information for the surface of material under study. XPS is applicable to solid samples and is most often accomplished by exciting a sample surface with mono-energetic x-rays and measuring the energy of the emitted electrons. From the binding energy, the intensity and the shape of the photoelectron peak the chemical elements present at the sample surface can be identified, the quantity of the identified element can be calculated, chemical state and electronic structure of the elements can be studied. The information provided by the XPS technique plays important role in the research in areas like: corrosion, catalysis, photovoltaics, display technology, electronic device development, magnetic media, nanomaterials, surface treatment, thin film coatings and many others.
For information regarding usage and training of the instruments in this lab, please contact the laboratory manager.